Headway Research - R & D Spin Coater

Organization Name :Headway Research

Summary : R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers.

Headway Research - LS22 ...

The LS22 Series of large substrate spinners is designed for versatility, ease of use and safety in a variety of manual and automated research and development process. ... See more

This technical paper laid out the future of yield management, covering all the issues the industry faced with defects and gave a vision for resolving them. It became the foundation on which KLA was built. Publi ... See more

Keys to Success

23 Mar 2006

In the final installment of this three-part interview, Jim Morgan expands on the strategies that made AMAT the successful company it is today. Topics covered include why perseverance works; balancing Kaizen m ... See more

Art Zafiropoulo and his ...

29 Nov 2004

Art Zafiropoulo was honored for championing technology through innovative marketing approaches: first with plasma etching and later with “mix and match” lithographic manufacturing strategies. ... See more

Gary Patton: What Math ...

Gary Patton never knew he wanted to be a scientist when he was a kid. ... See more

GCA XLS - Advanced Micr ...

The failure that was supposed to save the U.S. lithography infrastructure. It was simply a case of too little, too late. ... See more

Eaton's Semiconductor E ...

25 Oct 2006

Eaton's Semiconductor Foray, a case study. It was supposed to be the semiconductor equipment company of the future. ... See more

Cammax Precima - PRS14E ...

Cammax Precima - PRS14E Photoresist Spinner :1990s ... See more

JSR - Plasmaster-Si, Si ...

Plasmaster-Si is a silylation track specially dedicated to the Desire process. ... See more

Ultratech - Model 504 R ...

Ultratech - Model 504 Resist Develop/Rinse System - Positive photo resist Develop / Rinse Station Model 504 ... See more