Summary : The SUSS ACS200 Microlithography Cluster offers superior process performance and unsurpassed productivity for challenging coating applications including coatings of unusually thick and thin photoresist
SUSS spin coaters combine state of the art technology with an innovative concept ...
The Karl Suss company was one of the first companies to explore commercial X-Ray ...
Andy Grove talks at IMEC 2004 - the Intel Manufacturing Excellence Conference - ...
Canon - FPA-5000 ES2 Aligner :1990s - An early DUV scanner.
The semiconductor industry has always worked hard to have and to maintain extrem ...
Applied Materials - AMS 2000 Silox Reactor :1970s
High Throughput Bumped Wafer Characterization System
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Silicon Valley Group - Model 8800 ATS Track (Arm Transport System)
IBM’s R&D partnering model is one of the great business process innovations of t ...
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