Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
This technical paper laid out the future of yield management, covering all the i ...
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Bill Tobey on his 2006 Bob Graham Award and Lessons Learned
The AutoEtch 590 reduces ion bombardment and attendant device damage by placing ...
Starting a silicon revolution, also known as the “Fairchild Brain Drain,” Bo ...
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Access to and use of this Website is subject to TechInsights' Terms of Use (including Copyright Policy & Claims) and Privacy Policy. By accessing or using this Website you agree to TechInsights' Terms of Use (including Copyright Policy & Claims) and Privacy Policy.
Copyright © 2024 TechInsights Inc. All rights reserved.