Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Toshio Maruyama reflects on the history and future of Advantest and its role in ...
The new approach to etching and deposition: The PlanarEtch ||A Plasma systems fr ...
Dave Markle, Senior Vice President & Chief Technical Officer at Ultratech, descr ...
A common example of how low barriers to entry were.
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