Summary : Technology, Circa 1991 – As lithography moved into ever lower k factors, the concept of Phase Shifting the light, pioneered my Mark Levinsion at IBM, led to phase shift mask.
Tencor (later evolved to be KLA - Tencor) is in the bedrock of the semiconducto ...
This technical paper laid out the future of yield management, covering all the i ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
The tool that sparked the yield management revolution.
Technology, Circa 1981 – It's often the overlooked news that turn out to be cr ...
The dawn of automated inspection. KLA's mask inspection tools took over to see w ...
Here is the Mann and the man that together started two revolutions in the semico ...
TEL's semiconductor production equipments meet the need of the age of VLSI.
Introducing Micrascan III+ for Critical Level Lithography
Ed Segal was honored for his establishment of a global representative organizati ...
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