Auto Etch 590 Oxide Etcher

Organization Name :Lam Research

Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.

Excerpt from 1984 Annua ...

Lam Research Corporation was founded in 1980 when advance in micro miniaturization technology produce dramatic changes in the way that integrated circuits were made. ... See more

Excerpt from 1999 Annua ...

Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share ... See more

GCA - Mann 4800 Direct ...

30 Jun 1975

It broke the 1 micron CD barrier. ... See more

KLA 200 Series Reticle ...

15 Jun 1984

KLA's Reticle Inspection System was the first automatic inspection system to ensure that killer defects as small as 0.7 microns on both reticles and photomasks would be detected. ... See more

Pacific Western - The P ...

30 Jun 1965

A little system that was to become one of the most favored probers on the west coast was manufactured by PWS, Pacific Western Systems Inc.... ... See more

Kumud Srinivasan, Director of Fab Automation, Intel discusses the status of Semiconductor Fab Automation at Intel in this 2004 interview. Find out where Intel was at the time and what it saw ahead in fab autom ... See more

RVSI - WS-1000 Bumped W ...

31 Dec 1969

High Throughput Bumped Wafer Characterization System ... See more

2003: Steve Nakayama

29 Nov 2004

Steve Nakayama honored for his contribution in helping globalize the semiconductor equipment industry. He talks about how ITPC got started and the methods he used to convince Japanese semiconductor executives t ... See more

Silicon Valley Group - ...

Silicon Valley Group - Model 8800 ATS Track (Arm Transport System) ... See more

Applied Materials - Sil ...

Applied Materials - Silox Model AMS 1200 :1960s - Wafers were laid out by hand inside the chambers. ... See more