Auto Etch 590 Oxide Etcher

Organization Name :Lam Research

Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.

Excerpt from 1984 Annua ...

Lam Research Corporation was founded in 1980 when advance in micro miniaturization technology produce dramatic changes in the way that integrated circuits were made. ... See more

Excerpt from 1999 Annua ...

Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share ... See more

Cobilt - Autofab, Inlin ...

15 Jun 1974

Cobilt - Autofab, Inline Resist Processing System ... See more

This video is a manufacturing IT case study that shows Intel's first true 300mm manufacturing fab in Rio Rancho, New Mexico. While its first 300mm fab was in Oregon, it was dual-tasked with development. Here yo ... See more

SEMATECH - An Oral Hist ...

16 Jun 1992

An interview with Dave Anderson ... See more

TEL - Model TMC 4400-A ...

30 Jun 1985

If this photo looks a bit ghostly that’s because it is. We have no surviving photos of the TEL model TMC 4400-A ... See more

Eaton - Optimetrix 8000 ...

From the West Coast’s premier, but now dead, stepper company. ... See more

MTI - Omnichuck

OmniChuck Advanced Wafer Processing System ... See more

Applied Materials - Imp ...

Applied Materials - Implant 9000, Ion Implanter :1985-1989 ... See more

Yan Borodovsky with a d ...

19 Sep 2007

Yan Borodovsky demonstrates what was new in DFM and Computational Lithography at Intel in this historic 2007 interview. In this video, Yan Borodovsky, follows up on the first interview with a demonstration that ... See more