Summary : The AutoEtch 590 reduces ion bombardment and attendant device damage by placing the wafer on the grounded electrode.
Long regarded as technology leader in etch, Lam took additional aggressive steps ...
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Though not the first step & scan system—that honor goes to Perkin Elmer—this ...
Cobilt - Autofab, Inline Resist Processing System
It only took 196M Bytes of disk storage for masks in 1983, but hasn’t changed ...
What the cutting edge of etching looked like in 1980
A 6th gen maskless litho tool from the early 80's.
The AMI Model 2100 is an excellent representative of Second Optical Inspection s ...
The versatile programmability of Kasper's System 4000 High Pressure Scrubber all ...
Sean Maloney, who heads up Intel’s Mobility Group, talks about its new duo, 65 ...
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