Summary : Long regarded as technology leader in etch, Lam took additional aggressive steps in fiscal 1999 to position the Company for success and to gain market share
The AutoEtch 590 reduces ion bombardment and attendant device damage by placing ...
Lam Research Corporation was founded in 1980 when advance in micro miniaturizati ...
Jim Bowen talks about how he took Fairchild Test Systems Group from a money lose ...
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
Applied Materials - AMS 2000 Silox Reactor :1970s
The launch of Intel’s Centrino in 2003 marks move that took laptop PCs into th ...
A 6th gen maskless litho tool from the early 80's.
For years the Coyote held a favored spot among users as the best little CVD syst ...
Cameca was a European based attempt from the research department of Thomson CSF ...
Irie Seisakusho - Spin Drier
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