Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
Virtually everyone seemed to be entering the semiconductor capital equipment bus ...
KLA's Reticle Inspection System was the first automatic inspection system to ens ...
What About Bob - Robert Graham's video biography of his career with comments abo ...
The failure that was supposed to save the U.S. lithography infrastructure. It wa ...
For years the Coyote held a favored spot among users as the best little CVD syst ...
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Applied Materials - PECVD_application-bulletin :1970s
APT - 9155 E-Beam Resist Processor :1985-89
Applied Materials - CA-2020H Mask Aligner :1980-84
Irie Seisakusho - Spin Drier
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