Summary : A precursor to the excimer laser. But it was solely for X-ray wavelengths. It was an essential part of the infrastructure developed for a Next Generation Lithography technology that never materialized for other reasons.
Canon - FPA-5000 ES2 Aligner :1990s - An early DUV scanner.
The NSR-1505G2A is equipped with a new higher-resolution reduction projection le ...
Terry Higashi navigated TEL through the toughest times the Equipment Industry ha ...
Introducing Micrascan III+ for Critical Level Lithography
Important events and trends were in 1997 for the semiconductor industry
Applied Materials - The Omega-Centura System :1990s
Semiconductor Systems' new System 200 is state-of-the-art equipment for submicro ...
MultiFab's modular design provides easy reconfiguration, maintenance and repair.
Silicon Valley Group - Model 8800 ATS Track (Arm Transport System)
In this segment, learn from Wilf why learning the fundamentals are so important ...
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