Nippon Seiko - TZ-310 Exposure System

Organization Name :Nippon Seiko

Summary : TZ-310 Multi-Function System for Semiconductor Production

ASML - PAS 2000 Wafer S ...

30 Jun 1985

Virtually everyone seemed to be entering the semiconductor capital equipment business in the early eighties. An entourage of government bodies, both foreign and domestic, as well as interested but alien busines ... See more

Novellus - Concept One ...

30 Jun 1985

This photo shows a descendant of the first Concept One, almost a decade after its original development as a conventional CVD system. ... See more

Nikon - NSR Series Step ...

The series that launched a thousand careers. The NSR series would become the chip maker’s model of reliability, forcing all equipment manufacturers to build reliable tools. ... See more

GCA - Model 8000 DSW Wa ...

To stay ahead of your competition in the world of one micron production and the 1Mbit DRAM you need the brilliant performance of microlithography's brightest new star - the Model 8000 DSW system from GCA. ... See more

Takeda Riken Enters US ...

15 Jun 1982

Takeda Riken announces plans to enter the US ATE (automatic test equipment) market with a 5O-MHz logic semiconductor test system ... See more

Mihir on the History of ...

13 Aug 2008

Mihir on the History of Automation in the Semiconductor Industry ... See more

MTI - Omnichuck

OmniChuck Advanced Wafer Processing System ... See more

Cameca - XPWS 301 Proxi ...

Cameca - XPWS 301 Proximity Step and Repeat System :1980-84 - Thompson’s x-ray spin-off. ... See more

Toshiba - Space Linear ...

Toshibas advanced control technique created this highly innovative system ... See more

DW Industries Vacuum De ...

30 Jun 1965

During many of the early years, in a little shop on Arques Avenue in Sunnyvale, California, Davis & Wilder Industries produced some of the best bell-jar evaporators for the infant IC industries. Concentrating u ... See more