Semiconductor Systems' new System 200 is state-of-the-art equipment for submicro ...
The 8050 yields consistent, repeatable wafer-to-wafer results, providing maximum ...
The new approach to etching and deposition: The PlanarEtch ||A Plasma systems fr ...
This system, from about 1988, represents one of the most successful tungsten dep ...
An early excimer laser stepper for 0.45 micron.
Watch circuit test system 193A
An early disk coating system
Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84
Cameca - 600 Series Steppers :1980-84
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