The 200PCU Photostabilizer utilizes the standard dual unicassette wafer handling ...
Gemini-The Platform of Excellence for Photoresist Processing
Dual Chamber Photostabilizer
The state-of-the-art workhorse for 0.35 micron.
R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is ...
This system, from about 1988, represents one of the most successful tungsten dep ...
CONVAC Photo mask processing equipment
Semitool's history of engineering excellence includes the creation of the first ...
Applied Materials - AMS 1000 Silox Reactor :1970s
Model 6300C, 6301C(SEE ALSO MODEL 6300 & 6302 DATA SHEET) SUPER SCRUBBER WAFER C ...
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