In this 2003 Lithography Panel of experts, Bill Arnold, Gene Fuller, and Phil Ware discuss then current views of the possibility that 193nm immersion lithography might not work for manufacturing semiconductors. This is years before the technology would be in high volume manufacturing.
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Bill Arnold and his views about the future of semiconductor lithography in 2003.
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Martin van den Brink on 193nm Immersion Lithography
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Canon's Phil Ware discusses the issues surrounding the various lithography alter ...
Phil Ware discusses Immersion Lithography in this 2004 panel.
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