Back in 2003, it looked like Lithography Enhancing Technologies for reticles and wafers using techniques like dog-bone tricks, hard masks, etchers, etc. were running out of steam. Would Moore’s Law finally come to an end? In this historic video from 2003, Lithography experts, Bill Arnold, Gene Fuller, and Phil Ware discuss the issue.
What are the highest Numerical Apertures and k-factors that can be achieved with ...
Lithography Panel Q&A with Bill Arnold, Gene Fuller, and Phil Ware.
Andre Auberton-Herve: President & CEO, Soitec: Soitec's SOI Roadmap
Bill Arnold and his views about the future of semiconductor lithography in 2003.
Bill Arnold of ASML discusses Immersion Lithography in this 2004 panel.
Bill Arnold draws on a wealth of knowledge gleaned from having lots of immersion ...
Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm
Canon's Phil Ware discusses the issues surrounding the various lithography alter ...
Phil Ware discusses Immersion Lithography in this 2004 panel.
A tribute to Ken Schroeder • One of those rare individuals who without, ...
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