Mick Fukuda discusses Canon's strategy for introducing Immersion Lithography to semiconductor manufacturing in this historic 2005 panel. Topics covered include: When might it arrive to manufacturing. Readiness of immersion lithography. Numerical apertures, what fluids will be used and more.
Nat was one of the prime movers of EUV and without his perseverance, EUV may ne ...
Art Zafiropoulo: Chairman & CEO of Ultratech: Ultratech's Vision of the Future
Bill Arnold and his views about the future of semiconductor lithography in 2003.
Chandra Mouli: Director, Automated Manufacturing Technology, Intel: Intelligent ...
Lithography Panel: Bill Arnold, ASML on the question of Immersion vs. EUV at 32n ...
Bill Arnold of ASML discusses Immersion Lithography in this 2004 panel.
Bill Arnold draws on a wealth of knowledge gleaned from having lots of immersion ...
Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm
Gene Fuller covers the latest progress in lithography at Nikon in both immersion ...
Do design rules make it easier for chip engineers in a semiconductor wafer fab? ...
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