Irie Seisakusho - Spin Drier

Organization Name :Irie Seisakusho

Summary : Irie Seisakusho - Spin Drier

30 Jun 1985

The tool that sparked the yield management revolution. ... See more

ASML - Philips Beamwriter :1985-89 ... See more

The NSR-1505G2A is equipped with a new higher-resolution reduction projection lens that has a greater numeral aperture (N.A. = 0.35) ... See more

R & D spin coater for wafers up to 300 mm in diameter. Alignment system/chuck is for both the 200 mm and 300 mm wafers. ... See more

CONVAC Photo mask processing equipment ... See more

The failure that was supposed to save the U.S. lithography infrastructure. It was simply a case of too little, too late. ... See more

Electroglas - Model 3001 Wafer Prober System :1990s ... See more

Cambridge Instruments - EBML 300 :1985-89 - Maskless Lithography from twenty years ago. ... See more

Applied Materials - CA-800 Mask Aligner and Exposure System: :1980-84 ... See more

21 Aug 2008

Mihir Parikh tells us about the big Automation Do's and Don'ts ... See more