The history of technology development always looks like a clear linear path in retrospect. But it’s never clear when you’re in the middle of it. This historic video takes you back to 2003, when 193nm immersion was still a concept, 157nm exposure tools were expected to be ready soon, and progress on EUV was extremely difficult.
Lithography Panel: Gene Fuller, Nikon on... Immersion Lithography
Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm
Gene Fuller covers the latest progress in lithography at Nikon in both immersion ...
Nat was one of the prime movers of EUV and without his perseverance, EUV may ne ...
a real visionary for our industry the father of Europe’s equipment industry ...
Phil Ware and his views about the future of semiconductor lithography in 2003.
Lithography Panel 2005: Audience Q&A on... 32nm: Immersion or EUV?
Lithography Panel Q&A with Bill Arnold, Gene Fuller, and Phil Ware.
Phil Ware discusses Immersion Lithography in this 2004 panel.
Do design rules make it easier for chip engineers in a semiconductor wafer fab? ...
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