The history of technology development always looks like a clear linear path in retrospect. But it’s never clear when you’re in the middle of it. This historic video takes you back to 2003, when 193nm immersion was still a concept, 157nm exposure tools were expected to be ready soon, and progress on EUV was extremely difficult.
Lithography Panel: Gene Fuller, Nikon on... Immersion Lithography
Lithography Panel: Gene Fuller of Nikon on Immersion vs. EUV at 32nm
Gene Fuller covers the latest progress in lithography at Nikon in both immersion ...
Nat was one of the prime movers of EUV and without his perseverance, EUV may ne ...
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